Product Overview
The AMAT 0090-01100 is a precision-engineered semiconductor process valve designed for critical vacuum and gas delivery applications within wafer fabrication equipment. Manufactured to Applied Materials (AMAT) OEM specifications, this valve serves as a critical flow control component in semiconductor process chambers, managing the precise delivery and isolation of process gases, purge gases, and vacuum lines. Its robust construction and high-cycle actuation design ensure reliable performance in the demanding environments of plasma etching, chemical vapor deposition (CVD), and physical vapor deposition (PVD) systems. The valve’s sealing architecture is optimized for ultra-high purity (UHP) service, minimizing particle generation and outgassing to protect wafer integrity and maintain process yield.
Technical Specifications
| Parameter | Specification / Feature |
|---|---|
| Component Type | Process & Pneumatic Valve |
| Model Designation | AMAT 0090-01100 |
| Operating Pressure | Standard Semiconductor Process Grade (Vacuum to rated positive pressure) |
| Mounting & Connection | Standard AMAT OEM Interface / Flange Configuration |
| Actuation Type | Pneumatic / Solenoid Actuated |
| Sealing Material | High-purity elastomer / PTFE compatible for UHP service |
| Media Compatibility | Process gases, purge gases, vacuum lines |
Engineering Features & Advantages
- Precision Flow Control: Engineered for accurate gas delivery and isolation in semiconductor process chambers, ensuring repeatable process results and minimal dead volume.
- Ultra-High Purity Construction: Designed to minimize particle generation and outgassing, protecting wafer integrity and maintaining cleanroom compatibility.
- High-Cycle Reliability: Built for continuous operation under the demanding duty cycles of semiconductor fabrication equipment, reducing downtime and maintenance intervals.
- Direct Fit Replacement: Exact dimensional and functional compatibility with original AMAT OEM specifications, ensuring drop-in installation without modification.
- Leak-Tight Sealing: Advanced seal design provides reliable isolation of process gases and vacuum lines, preventing cross-contamination and maintaining chamber integrity.
Typical Industrial Applications
This AMAT process valve is commonly deployed in semiconductor wafer fabrication environments, including plasma etching (dry etch) systems, chemical vapor deposition (CVD) and physical vapor deposition (PVD) process chambers, ion implantation equipment, and vacuum load-lock and transfer modules. It is also suitable for other high-purity industrial processes requiring precise pneumatic valve control, such as flat panel display manufacturing and photovoltaic cell production lines.
PRODUCT IMAGES
AMAT 0090-01100 Semiconductor Process Valve
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Shop the genuine AMAT 0090-01100 Solenoid Directional Control Valve. This USA-made 24 VDC hydraulic component features a 4-way 3-position design, delivering leak-free, reliable fluid control for heavy-duty industrial systems.