Product Overview
The LAM RESEARCH 796-801289-001 / 93-6127 is a precision-engineered semiconductor process valve designed for critical fluid and gas control applications within wafer fabrication equipment. Manufactured by Lam Research, a global leader in semiconductor process equipment, this valve is a direct OEM replacement component engineered to deliver leak-tight, contamination-free performance in demanding vacuum and process environments. As a general process and pneumatic valve, it utilizes a pneumatically actuated diaphragm or bellows-sealed mechanism to provide reliable on/off isolation of process gases and chemistries. Its compact, corrosion-resistant construction ensures compatibility with reactive gases and high-purity fluid handling, making it an essential component in etch, deposition, and cleaning process modules.
Technical Specifications
| Parameter | Specification / Feature |
|---|---|
| Component Type | General Process & Pneumatic Valve |
| Model Designation | 796-801289-001 / 93-6127 |
| Operating Pressure | Standard Industrial Grade (Up to rated bar) |
| Mounting & Connection | Standard ISO / Manufacturer Interface |
| Actuation Type | Pneumatic (Air-Operated) |
| Sealing Mechanism | Diaphragm / Bellows-Sealed, Leak-Tight |
| Media Compatibility | High-Purity Process Gases & Reactive Chemistries |
| Body Material | Corrosion-Resistant Stainless Alloy |
Engineering Features & Advantages
- Precision Performance: Pneumatic actuation delivers rapid, repeatable on/off response with minimal particle generation, ensuring consistent process gas isolation and flow control in high-cycle semiconductor applications.
- Industrial Reliability: Built for continuous operation under severe industrial conditions, including high-purity vacuum environments and exposure to aggressive process chemistries.
- Direct Fit Replacement: Exact dimensional and functional compatibility with original OEM standards, ensuring drop-in replacement without modification to existing Lam Research process modules.
- Contamination-Free Design: Diaphragm or bellows sealing isolates the actuation mechanism from the process media, preventing particulate contamination and extending service life.
- Compact Integration: Space-efficient form factor enables installation in dense semiconductor tool configurations without compromising accessibility or performance.
Typical Industrial Applications
This process valve is primarily deployed in semiconductor wafer fabrication environments, including plasma etch chambers, chemical vapor deposition (CVD) and atomic layer deposition (ALD) systems, and wafer cleaning stations. It is also suitable for high-purity gas delivery panels, vacuum line isolation, and other critical process control points in photovoltaic and flat-panel display manufacturing where leak-tight pneumatic valve performance is essential.
PRODUCT IMAGES
LAM RESEARCH 796-801289-001 / 93-6127 Semiconductor Process Valve
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- Authentic & Fully Tested: 100% bench tested for hydraulic response, pressure rating, and null-bias stability before dispatch.
- Fast Dispatch: In-stock units ready for same-day dispatch via DHL / FedEx Express directly to your plant.
- Pre-Shipment Verification: High-definition photos, video testing runs, and serial number verification provided prior to shipment.
- Peace of Mind: Covered by our 12-Month Replacement Warranty.
Shop the genuine LAM RESEARCH 796-801289-001 / 93-6127 Solenoid Valve. This USA-made 24 VDC hydraulic component features a 2-way normally closed design, delivering leak-free, reliable fluid control for heavy-duty industrial systems.