Product Overview

The LAM RESEARCH 796-293477-100 is a genuine OEM spare part engineered for Lam Research semiconductor processing equipment, including plasma etch, thin film deposition, and wafer cleaning platforms. As a precision-fabricated component within the tool’s fluid and gas delivery or mechanical assembly subsystem, this part supports the ultra-high-purity and vacuum-compatible operating conditions required in wafer fabrication. Manufactured to Lam Research’s exacting dimensional and material specifications, it serves as a direct-fit replacement to maintain process repeatability, minimize particle contamination, and reduce unplanned downtime in front-end semiconductor manufacturing lines.

Technical Specifications

Engineering Features & Advantages

• Precision Performance: Fabricated to original Lam Research tolerances, ensuring consistent mechanical and fluidic behavior that protects wafer yield and process uniformity.
• Cleanroom Compatibility: Designed for ultra-high-purity environments with minimal outgassing and particle generation, meeting semiconductor fab contamination-control standards.
• Industrial Reliability: Built for continuous, high-duty-cycle operation inside plasma and vacuum process chambers under aggressive chemical exposure.
• Direct Fit Replacement: Exact dimensional and functional compatibility with the original OEM part, eliminating modification and reducing mean time to repair (MTTR).

Typical Industrial Applications

This Lam Research spare part is deployed in semiconductor front-end fabrication environments, including plasma etch and reactive ion etch (RIE) systems, chemical vapor deposition (CVD) and atomic layer deposition (ALD) tools, wafer cleaning and surface preparation platforms, and physical vapor deposition (PVD) chambers. It is also suitable for maintenance, repair, and overhaul (MRO) programs in 200mm and 300mm wafer fabs, as well as R&D pilot lines requiring validated OEM components.

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