Product Overview
The HORIBA STEC GR-312F is a high-precision mass flow controller (MFC) engineered for accurate measurement and regulation of gas flow in semiconductor, thin-film, and advanced industrial process systems. Utilizing a thermal sensor-based capillary measurement principle combined with a fast-response piezoelectric or solenoid-actuated control valve, the GR-312F delivers stable, repeatable flow control independent of upstream pressure and temperature fluctuations. As a critical component in process gas delivery lines, it ensures precise stoichiometric control for deposition, etch, and purge operations where flow accuracy directly impacts yield and process integrity.
Technical Specifications
| Parameter | Specification / Feature |
|---|---|
| Component Type | Mass Flow Controller (Process & Pneumatic Valve) |
| Model Designation | GR-312F |
| Manufacturer | HORIBA STEC |
| Operating Pressure | Standard Industrial Grade (Up to rated bar, differential pressure dependent) |
| Flow Measurement Principle | Thermal capillary sensor with bypass laminar flow element |
| Control Actuation | Fast-response electromagnetic proportional valve |
| Mounting & Connection | Standard ISO / Manufacturer Interface (VCR or compression fitting compatible) |
| Accuracy Class | ±1% of full scale (typical, dependent on calibration gas) |
| Response Time | ≤ 1–2 seconds to setpoint (typical) |
Engineering Features & Advantages
- Precision Flow Metering: Thermal sensor technology provides accurate, repeatable gas flow control with minimal sensitivity to pressure and temperature variations, ensuring process consistency in critical semiconductor and thin-film applications.
- Fast Dynamic Response: The integrated proportional control valve delivers rapid setpoint tracking and stable regulation, minimizing overshoot and settling time during process transitions.
- Industrial Reliability: Built for continuous operation under severe industrial conditions, with robust construction that withstands corrosive and reactive process gases when specified with appropriate wetted materials.
- Direct Fit Replacement: Exact dimensional and functional compatibility with original OEM standards, enabling drop-in replacement without modification to existing gas delivery panels or manifold assemblies.
- Calibration Traceability: Factory-calibrated against NIST-traceable standards, with calibration data available for process validation and quality system compliance.
Typical Industrial Applications
The HORIBA STEC GR-312F mass flow controller is deployed in semiconductor wafer fabrication equipment for chemical vapor deposition (CVD), plasma etching, and sputtering processes; thin-film solar panel manufacturing lines; precision gas blending and mixing systems for industrial furnace atmospheres; and analytical instrumentation requiring accurate carrier or
PRODUCT IMAGES
HORIBA STEC GR-312F Mass Flow Controller
⚡ Emergency Plant Maintenance & Ready-to-Ship Notice:
- Authentic & Fully Tested: 100% bench tested for hydraulic response, pressure rating, and null-bias stability before dispatch.
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- Pre-Shipment Verification: High-definition photos, video testing runs, and serial number verification provided prior to shipment.
- Peace of Mind: Covered by our 12-Month Replacement Warranty.
Shop the genuine HORIBA STEC GR-312F Mass Flow Controller. This Japan-made precision device features advanced thermal sensing, delivering accurate, repeatable gas flow control for critical industrial processes.